Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水化是以高纯水蒸化气氛,硅片表面的硅原子和水分子反生成二化硅。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水化是以高纯水蒸化气氛,硅片表面的硅原子和水分子反生成二化硅。
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